Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies
| Autor: | N. Muesgens, G. Guentherodt, Barbaros Oezyilmaz, M. Hawraneck, Joachim Mayer, M. Bueckins, Michael Fraune, G. Richter, Bernd Beschoten |
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| Rok vydání: | 2005 |
| Předmět: |
Physics
Magnetization dynamics Condensed Matter - Materials Science Fabrication Condensed Matter - Mesoscale and Nanoscale Physics business.industry Spin-transfer torque General Physics and Astronomy Materials Science (cond-mat.mtrl-sci) FOS: Physical sciences Insulator (electricity) Focused ion beam Computer Science::Other Mesoscale and Nanoscale Physics (cond-mat.mes-hall) Optoelectronics Undercut Thin film business Nanopillar |
| DOI: | 10.48550/arxiv.cond-mat/0512283 |
| Popis: | Focused-ion-beam milling is used to fabricate nanostencil masks suitable for the fabrication of magnetic nanostructures relevant for spin transfer torque studies. Nanostencil masks are used to define the device dimensions prior to the growth of the thin film stack. They consist of a wet etch resistant top layer and an insulator on top of a pre-patterned bottom electrode. The insulator supports a hard mask and gives rise to an undercut by its selective etching. The approach is demonstrated by fabricating current perpendicular to the plane Co/Cu/Co nanopillar junctions, which exhibit current-induced magnetization dynamics. Comment: 13 pages, 3 figures, submitted to APL |
| Databáze: | OpenAIRE |
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