PULSED LASER DEPOSITION OF OXIDE THIN FILMS

Autor:	P. Verardi, N. Scarisoreanu, D. Brodoceanu, Mihaela Filipescu, G. Epurescu, Floriana Craciun, Maria Dinescu, D.G. Matei
Rok vydání:	2004
Předmět:	chemistry.chemical_compound Carbon film Materials science chemistry business.industry Electronic engineering Oxide Optoelectronics Combustion chemical vapor deposition Thin film business Pulsed laser deposition
Zdroj:	International Workshop Plasma Production by Laser Ablation, PPLA 2003, Messina, Italy, 2003 info:cnr-pdr/source/autori:Brodoceanu D., Scarisoreanu N., Filipescu M., Epurescu G., Matei D., Verardi P., Craciun F., Dinescu M./congresso_nome:International Workshop Plasma Production by Laser Ablation, PPLA 2003/congresso_luogo:Messina, Italy/congresso_data:2003/anno:2003/pagina_da:/pagina_a:/intervallo_pagine
DOI:	10.1142/9789812702555_0005
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f9582b44ef5f14939c81efce2e14c422 https://doi.org/10.1142/9789812702555_0005 Zobrazit plný text záznamu