Large-area optical metasurface fabrication using nanostencil lithography
| Autor: | Hualiang Zhang, Seoyoung Joo, Sensong An, Helena Jiang, Duanhui Li, Tian Gu, Juejun Hu, Anuradha M. Agarwal, Lan Li, Peter Su, Mikhail Y. Shalaginov, Lionel C. Kimerling |
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| Rok vydání: | 2021 |
| Předmět: |
Spin coating
Materials science Fabrication business.industry 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Atomic and Molecular Physics and Optics law.invention 010309 optics Lens (optics) Optics Resist law 0103 physical sciences Focal length Thin film 0210 nano-technology business Lithography Electron-beam lithography |
| Zdroj: | Optics letters. 46(10) |
| ISSN: | 1539-4794 |
| Popis: | We demonstrate a large-area fabrication process for optical metasurfaces utilizing reusable SiN on Si nanostencils. To improve the yield of the nanostencil fabrication, we partially etch the front-side SiN layer to transfer the metasurface pattern from the resist to the nanostencil membrane, preserving the integrity of the membrane during the subsequent potassium hydroxide etch. To enhance the reliability and resolution of metasurface fabrication using the nanostencil, we spin coat a sacrificial layer of resist to precisely determine the gap between the nanostencil and the metasurface substrate for the subsequent liftoff. 1.5 mm diameter PbTe meta-lenses on C a F 2 fabricated using nanostencils show diffraction-limited focusing and focusing efficiencies of 42% for a 2 mm focal length lens and 53% for a 4 mm focal length lens. The nanostencils can also be cleaned using chemical cleaning methods for reuse. |
| Databáze: | OpenAIRE |
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