Ferroelectric Tunneling Junctions Based on Aluminum Oxide/ Zirconium-Doped Hafnium Oxide for Neuromorphic Computing

Autor: Haonan Wu, Fubo Rao, Wenjuan Zhu, Hojoon Ryu
Rok vydání: 2019
Předmět:
Zdroj: Scientific Reports
Scientific Reports, Vol 9, Iss 1, Pp 1-8 (2019)
ISSN: 2045-2322
DOI: 10.1038/s41598-019-56816-x
Popis: Ferroelectric tunneling junctions (FTJs) with tunable tunneling electroresistance (TER) are promising for many emerging applications, including non-volatile memories and neurosynaptic computing. One of the key challenges in FTJs is the balance between the polarization value and the tunneling current. In order to achieve a sizable on-current, the thickness of the ferroelectric layer needs to be scaled down below 5 nm. However, the polarization in these ultra-thin ferroelectric layers is very small, which leads to a low tunneling electroresistance (TER) ratio. In this paper, we propose and demonstrate a new type of FTJ based on metal/Al2O3/Zr-doped HfO2/Si structure. The interfacial Al2O3 layer and silicon substrate enable sizable TERs even when the thickness of Zr-doped HfO2 (HZO) is above 10 nm. We found that F-N tunneling dominates at read voltages and that the polarization switching in HZO can alter the effective tunneling barrier height and tune the tunneling resistance. The FTJ synapses based on Al2O3/HZO stacks show symmetric potentiation/depression characteristics and widely tunable conductance. We also show that spike-timing-dependent plasticity (STDP) can be harnessed from HZO based FTJs. These novel FTJs will have high potential in non-volatile memories and neural network applications.
Databáze: OpenAIRE