Study of thin oxide films by electron, Ion and synchrotron radiation beams
| Autor: | Aivar Tarre, Kai Arstila, Arvo Kikas, Eero Rauhala, Jaan Aarik, A. Seppälä, Indrek Martinson, Juhan Karlis, Alex Zakharov, Jelena Asari, Väino Sammelselg |
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| Předmět: |
010302 applied physics
Silicon technology industry and agriculture Analytical chemistry chemistry.chemical_element Synchrotron radiation 02 engineering and technology Electron microprobe 021001 nanoscience & nanotechnology 01 natural sciences Microanalysis Analytical Chemistry Titanium oxide Elastic recoil detection chemistry 0103 physical sciences Cubic zirconia Thin film 0210 nano-technology |
| Zdroj: | Scopus-Elsevier |
| Popis: | Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures. |
| Databáze: | OpenAIRE |
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