Fabrication of 128×128 element optical switch array by micromachining technology
| Autor: | G. Huang, Xinjian Yi, S.B. Wang, Sihai Chen, Bifeng Xiong, Shaowei Zhou |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Materials science
Fabrication Computer Networks and Communications Annealing (metallurgy) Computer science Engraving Ion beam lithography Optical switch law.invention Optics Artificial Intelligence law Etching Thin film Lithography business.industry General Engineering Surface micromachining Hardware and Architecture visual_art visual_art.visual_art_medium Optoelectronics Photolithography business Temperature coefficient Software |
| Zdroj: | Microprocessors and Microsystems. 29:21-25 |
| ISSN: | 0141-9331 |
| DOI: | 10.1016/j.micpro.2004.07.003 |
| Popis: | Polycrystalline VO 2 thin films were obtained on Si substrates by ion beam sputtering deposition and annealing in flowing Ar gas. SEM images indicate that VO 2 thin films were grown into compact surfaces. Four-probe measurements indicated that the VO 2 thin films own good electrical homogeneity. After the films' production, micromachining technology including lithography, reaction ion etching and metallization connection processes was used to produce the optical switch array. As a result, the 128×128 element optical switch array was achieved. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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