UV-Assisted Modification and Removal Mechanism of a Fluorocarbon Polymer Film on Low-k Dielectric Trench Structure
Autor: | Oliver Chyan, Arindom Goswami, Tamal Mukherjee, Kanwal Jit Singh, Ian Brown, Seare A. Berhe |
---|---|
Rok vydání: | 2015 |
Předmět: | |
Zdroj: | ACS Applied Materials & Interfaces. 7:5051-5055 |
ISSN: | 1944-8252 1944-8244 |
Popis: | In this study, we report the first chemical characterization of a plasma-deposited model fluoropolymer on low-k dielectric nanostructure and its decomposition in UV/O2 conditions. Carbonyl incorporation and progressive removal of fluorocarbon fragments from the polymer were observed with increasing UV (≥230 nm) irradiation under atmospheric conditions. A significant material loss was achieved after 300 s of UV treatment and a subsequent wet clean completely removed the initially insoluble fluoropolymer from the patterned nanostructures. A synergistic mechanism of UV light absorption by carbonyl chromophore and oxygen incorporation is proposed to account for the observed photodegradation of the fluoropolymer. |
Databáze: | OpenAIRE |
Externí odkaz: |