UV-Assisted Modification and Removal Mechanism of a Fluorocarbon Polymer Film on Low-k Dielectric Trench Structure

Autor:	Oliver Chyan, Arindom Goswami, Tamal Mukherjee, Kanwal Jit Singh, Ian Brown, Seare A. Berhe
Rok vydání:	2015
Předmět:	chemistry.chemical_classification Nanostructure Materials science Low-k dielectric Polymer Dielectric Photochemistry chemistry.chemical_compound chemistry Polymer chemistry Fluoropolymer General Materials Science Irradiation Fluorocarbon Photodegradation
Zdroj:	ACS Applied Materials & Interfaces. 7:5051-5055
ISSN:	1944-8252 1944-8244
Popis:	In this study, we report the first chemical characterization of a plasma-deposited model fluoropolymer on low-k dielectric nanostructure and its decomposition in UV/O2 conditions. Carbonyl incorporation and progressive removal of fluorocarbon fragments from the polymer were observed with increasing UV (≥230 nm) irradiation under atmospheric conditions. A significant material loss was achieved after 300 s of UV treatment and a subsequent wet clean completely removed the initially insoluble fluoropolymer from the patterned nanostructures. A synergistic mechanism of UV light absorption by carbonyl chromophore and oxygen incorporation is proposed to account for the observed photodegradation of the fluoropolymer.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f0b6a8003bdfb2c9eca7cba328e42c76 https://doi.org/10.1021/am508734b Zobrazit plný text záznamu