Insight into Selective Surface Reactions of Dimethylamino-trimethylsilane for Area-Selective Deposition of Metal, Nitride, and Oxide

Autor:	Annelies Delabie, Yoann Tomczak, Boon Teik Chan, Job Soethoudt, Ben Meynaerts
Rok vydání:	2020
Předmět:	Technology Materials science Materials Science PASSIVATION INHIBITION Oxide Materials Science Multidisciplinary TDMAT 02 engineering and technology Nitride 010402 general chemistry 01 natural sciences TITANIUM NITRIDE Catalysis Metal chemistry.chemical_compound Nanoscience & Nanotechnology Physical and Theoretical Chemistry Science & Technology Chemistry Physical Trimethylsilane SILYLATION 021001 nanoscience & nanotechnology Selective deposition FILM GROWTH Selective surface 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Chemistry General Energy chemistry Chemical engineering TIN visual_art Physical Sciences visual_art.visual_art_medium Science & Technology - Other Topics ATOMIC LAYER DEPOSITION 0210 nano-technology Deposition (chemistry) ANATASE TIO2 NUCLEATION
Zdroj:	The Journal of Physical Chemistry C. 124:7163-7173
ISSN:	1932-7455 1932-7447
DOI:	10.1021/acs.jpcc.9b11270
Popis:	Area-selective deposition (ASD) is a promising bottom-up manufacturing solution for catalysts and nanoelectronic devices. However, industrial applications are limited as highly selective ASD proces...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f0a92825aabee40e72817ddbdd293a06 https://doi.org/10.1021/acs.jpcc.9b11270 Zobrazit plný text záznamu