Fundamental edge broadening effects during focused electron beam induced nanosynthesis
| Autor: | Robert Winkler, P. D. Rack, Harald Plank, Jason D. Fowlkes, Roland Schmied |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2015 |
| Předmět: |
Materials science
General Physics and Astronomy Nanotechnology Electron Edge (geometry) lcsh:Chemical technology Molecular physics lcsh:Technology Full Research Paper Microscopy General Materials Science lcsh:TP1-1185 platinum Electrical and Electronic Engineering Electron beam-induced deposition focused electron beam induced deposition lcsh:Science Scaling lcsh:T Conductive atomic force microscopy simulation lcsh:QC1-999 Nanoscience Nanolithography Cathode ray nanofabrication lcsh:Q lcsh:Physics |
| Zdroj: | Beilstein Journal of Nanotechnology, Vol 6, Iss 1, Pp 462-471 (2015) Beilstein Journal of Nanotechnology |
| ISSN: | 2190-4286 |
| Popis: | The present study explores lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. Moreover, it is demonstrated that intermediate energies lead to even more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution. |
| Databáze: | OpenAIRE |
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