Using chemical vapor deposited films to control domain orientation in block copolymer thin films
Autor: | Willson, C. Grant, Seshimo, Takehiro, Durand, William J., Ellison, Christopher John, Bates, Christopher M., Cushen, Julia, Santos, Logan J., Dean, Leon, Rausch, Erica L. |
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Rok vydání: | 2019 |
Předmět: |
Y10T428/31931
427/255.395 427/255.6 Y10S977/89 Y10S977/788 Y10S977/888 Y10T428/24802 977/888 977/788 G03F7/0002 B81C1/00031 C03C2218/152 427/255.19 Y10S977/839 Y10T428/31504 427/255.15 427/255.14 427/255.11 Y10T428/31663 Y10S977/811 C03C17/3405 B82Y40/00 B81C2201/0149 Y10S977/891 977/809 977/839 C09D153/00 B29C43/32 B82Y10/00 C03C17/30 977/811 C23C16/44 977/891 427/255.29 977/890 427/255.28 Y10S977/809 |
DOI: | 10.26153/tsw/3619 |
Popis: | Vacuum deposited thin films of material are described to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns. |
Databáze: | OpenAIRE |
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