Study of required conditions to limit the dielectric charging phenomenon when measuring the electron emission yield from thin dielectric layers

Autor: Rigoudy, Charles, Makasheva, Kremena, Teyssedre, G., Boudou, Laurent, Belhaj, M., Dadouch, S.
Přispěvatelé: LAboratoire PLasma et Conversion d'Energie (LAPLACE), Université Toulouse III - Paul Sabatier (UT3), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées, Matériaux et Procédés Plasmas (LAPLACE-MPP), Université Fédérale Toulouse Midi-Pyrénées-Université Toulouse III - Paul Sabatier (UT3), Diélectriques Solides et Fiabilité (LAPLACE-DSF), ONERA / DPHY, Université de Toulouse [Toulouse], ONERA-PRES Université de Toulouse
Jazyk: angličtina
Rok vydání: 2018
Předmět:
Zdroj: 2018 IEEE 2nd International Conference on Dielectrics (ICD)
2018 IEEE 2nd International Conference on Dielectrics (ICD), Jul 2018, Budapest, Hungary. pp.1-4, ⟨10.1109/ICD.2018.8468360⟩
DOI: 10.1109/ICD.2018.8468360⟩
Popis: International audience; The electron emission yield of materials is an important quantity to be determined in various fields of physics. Among them, dielectric materials have a strong ability to retain charges and remain charged when submitted to electrical field, in particular when irradiated by electron beam. Without the use of specific measurement methodology, experimental investigation of dielectric materials may lead to an inaccurate measurement of the total electron emission yield (TEEY). This paper shows that a particular attention should be paid to the pulse duration of the incident electron beam and to hysteresis effects induced by charge trapping.
Databáze: OpenAIRE