Structural phase states in nickel-titanium surface layers doped with silicon by plasma immersion ion implantation
Autor: | Konstantin V. Krukovsky, Oleg A. Kashin, A. A. Neiman, Marina G. Ostapenko, Andrey N. Kudryashov, Aleksandr Lotkov, Dmitry P. Borisov |
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Přispěvatelé: | Томский государственный университет Физический факультет Кафедра физики металлов |
Jazyk: | angličtina |
Rok vydání: | 2015 |
Předmět: |
ионная имплантация
Materials science сплавы Silicon R-Phase Doping Metallurgy technology industry and agriculture chemistry.chemical_element engineering.material equipment and supplies Plasma-immersion ion implantation никель Lattice constant chemistry Coating Nickel titanium engineering титан Surface layer Composite material |
Zdroj: | AIP Conference Proceedings. 2015. Vol. 1683. P. 020078-1-020078-5 |
Popis: | The paper reports on a study of NiTi-based alloys used for manufacturing self-expanding intravascular stents to elucidate how the technological modes of plasma immersion ion implantation with silicon influence the chemical and phase composition of their surface layers. It is shown that two types of surface structure can be obtained depending on the mode of plasma immersion implantation: quasi-amorphous Si coating and Si-doped surface layer. The Si-doped surface layer contains new phases: a phase structured as the main B2 phase of NiTi but with a lower lattice parameter, R phase, and phase of highly dispersed SiO2 precipitates. |
Databáze: | OpenAIRE |
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