Relationship between Oxygen Defects and Properties of Scandium Oxide Films Prepared by Ion-Beam Sputtering
| Autor: | Ping Ma, Yunti Pu, Jiliang Zhu, Pengfei Kong |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Analytical chemistry chemistry.chemical_element 02 engineering and technology 01 natural sciences Oxygen Crystal chemistry.chemical_compound Sputtering oxygen defects 0103 physical sciences Materials Chemistry Surface roughness Transmittance Thin film 010302 applied physics ion-beam sputtering oxygen flow rates Surfaces and Interfaces Scandium oxide 021001 nanoscience & nanotechnology Surfaces Coatings and Films chemistry lcsh:TA1-2040 properties 0210 nano-technology lcsh:Engineering (General). Civil engineering (General) Refractive index scandium oxide thin films |
| Zdroj: | Coatings, Vol 9, Iss 8, p 517 (2019) Coatings Volume 9 Issue 8 |
| ISSN: | 2079-6412 |
| Popis: | Scandium oxide (Sc2O3) thin films with different numbers of oxygen defects were prepared by ion-beam sputtering under different oxygen flow rates. The results showed that the oxygen defects heavily affected crystal phases, optical properties, laser-induced damage threshold (LIDT) and surface quality of Sc2O3 films. The thin film under 0 standard-state cubic centimeter per minute (sccm) oxygen flow rate had the largest number of oxygen defects, which resulted in the lowest transmittance, LIDT and the worst surface quality. In addition, the refractive index of 0 sccm Sc2O3 film could not be measured in the same way. When the oxygen flow rate was 15 sccm, the Sc2O3 film possessed the best transmittance, refractive index, LIDT and surface roughness due to the lowest number of oxygen defects. This work elucidated the relationship between oxygen defects and properties of Sc2O3 films. Controlling oxygen flow rate was an important step of limiting the number of oxygen defects, which is of great significance for industrial production. |
| Databáze: | OpenAIRE |
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