Molecule-by-Molecule Writing Using a Focused Electron Beam
| Autor: | Jakob Birkedal Wagner, Ben L. Feringa, Willem F. van Dorp, Xiaoyan Zhang, Thomas Willum Hansen, Jeff Th. M. De Hosson |
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| Přispěvatelé: | Stratingh Institute of Chemistry |
| Rok vydání: | 2012 |
| Předmět: |
GRAPHENE
Materials science in situ electron microscopy FABRICATION General Physics and Astronomy Electrons Nanotechnology single molecule Electron nanostructuring law.invention Molecular Imprinting law Materials Testing Miniaturization INDUCED DEPOSITION General Materials Science Electron beam-induced deposition Lithography Graphene Resolution (electron density) local modification General Engineering SINGLE ATOMS Nanostructures focused electron-beam-induced deposition Cathode ray Graphite Photolithography |
| Zdroj: | Acs Nano, 6(11), 10076-10081. AMER CHEMICAL SOC |
| ISSN: | 1936-086X 1936-0851 |
| DOI: | 10.1021/nn303793w |
| Popis: | The resolution of lithography techniques needs to be extended beyond their current limits to continue the trend of miniaturization and enable new applications. But what is the ultimate spatial resolution? It is known that single atoms can be imaged with a highly focused electron beam. Can single atoms also be written with an electron beam? We verify this with focused electron-beam-induced deposition (FEBID), a direct-write technique that has the current record for the smallest feature written by (electron) optical lithography. We show that the deposition of an organometallic precursor on graphene can be followed molecule-by-molecule with FEBID. The results show that mechanisms that are inherent to the process inhibit a further increase in control over the process. Hence, our results present the resolution limit of (electron) optical lithography techniques. The writing of isolated, subnanometer features with nanometer precision can be used, for instance, for the local modification of graphene and for catalysis. |
| Databáze: | OpenAIRE |
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