A Chemical Perspective of GaN Polarity: The use of Hydrogen Plasma Dry Etching Versus NaOH Wet Etching to Determine Polarity

Autor:	Giovanni Bruno, Maria Losurdo, W. Alan Doolittle, April S. Brown, MariaMichela Giangregorio, Pio Capezzuto, Gon Namkoong
Rok vydání:	2002
Předmět:	Materials science Morphology (linguistics) Surface reactivity Etching (microfabrication) Polarity (physics) technology industry and agriculture Analytical chemistry Plasma Dry etching Reactive-ion etching Hydrogen treatment
Zdroj:	Scopus-Elsevier
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-722-k3.4
Popis:	The use of dry hydrogen plasma etching is evaluated for determination of GaN polarity and critically compared to wet etching in NaOH. It is shown that hydrogen plasma etching is effective in revealing inversion domains (IDs) and some types of dislocations. This is because the surface morphology is unchanged by the hydrogen treatment, and, hence, the surface reactivity is not masked.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e89e1d64c0a44cdf35c84e7292baac51 https://doi.org/10.1557/proc-722-k3.4 Zobrazit plný text záznamu Full text from SpringerLink