Novel Approaches for Intensifying Negative C60 Ion Beams Using Conventional Ion Sources Installed on a Tandem Accelerator
| Autor: | Aya Usui, Kazumasa Narumi, K. Yamada, Atsuya Chiba, Yuichi Saitoh, Yoshimi Hirano |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2020 |
| Předmět: |
tandem accelerator
Nuclear and High Energy Physics Materials science TIARA 02 engineering and technology Radiation electron attachment lcsh:Technology 01 natural sciences Ion negative fullerene ion source Optics 0203 mechanical engineering Sputtering Physics::Plasma Physics Ionization 0103 physical sciences Electron attachment Physics::Atomic and Molecular Clusters 010302 applied physics 020301 aerospace & aeronautics Tandem lcsh:T business.industry Tandem accelerator Atomic and Molecular Physics and Optics Ion source Physics::Accelerator Physics lcsh:Electrical engineering. Electronics. Nuclear engineering business lcsh:TK1-9971 |
| Zdroj: | Quantum Beam Science Volume 4 Issue 1 Quantum Beam Science, Vol 4, Iss 1, p 13 (2020) |
| ISSN: | 2412-382X |
| DOI: | 10.3390/qubs4010013 |
| Popis: | We developed novel methods for producing negative C60 ion beams at the accelerator facility Takasaki Ion Accelerators for Advanced Radiation Application (TIARA) to increase the current intensity of swift C60 ion beams accelerated to the MeV energy region using a tandem accelerator. We produced negative C60 ion beams with an intensity of 1.3 µ A, which is several tens of thousands of times greater than the intensity of beams produced using conventional methods based on the Cs sputtering process. These beams were obtained by temporarily adding an ionization function based on electron attachment to an existing ion source that is widely used in tandem accelerators. The high-intensity swift C60 ion beams can be made available relatively easily to institutes that have tandem accelerators and ion sources of the type used at TIARA because there is no need to change existing ion sources or install new ones. |
| Databáze: | OpenAIRE |
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