The Effect of Pulsed Current and Organic Additives on Hydrogen Incorporation in Electroformed Copper Used in Ultrahigh Vacuum Applications
| Autor: | M.-L. Doche, Jean-Yves Hihn, Jason Rolet, Paolo Chiggiato, Leonel Ferreira, Virginie Moutarlier, Lucia Lain Amador, P. Massuti-Ballester, M. P. Gigandet, Mauro Taborelli |
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| Přispěvatelé: | European Organization for Nuclear Research (CERN), Univers, Transport, Interfaces, Nanostructures, Atmosphère et environnement, Molécules (UMR 6213) (UTINAM), Université de Franche-Comté (UFC), Université Bourgogne Franche-Comté [COMUE] (UBFC)-Université Bourgogne Franche-Comté [COMUE] (UBFC)-Centre National de la Recherche Scientifique (CNRS)-Institut national des sciences de l'Univers (INSU - CNRS), Institut de recherche technologique Matériaux Métallurgie et Procédés (IRT M2P) |
| Jazyk: | angličtina |
| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Materials science Hydrogen Renewable Energy Sustainability and the Environment Metallurgy chemistry.chemical_element 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Copper Accelerators and Storage Rings Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry [SDU]Sciences of the Universe [physics] 0103 physical sciences Electroforming Materials Chemistry Electrochemistry [CHIM]Chemical Sciences Current (fluid) 0210 nano-technology ComputingMilieux_MISCELLANEOUS |
| Zdroj: | Journal of The Electrochemical Society Journal of The Electrochemical Society, Electrochemical Society, 2019, 166 (10), pp.D366-D373. ⟨10.1149/2.1211908jes⟩ |
| ISSN: | 0013-4651 1945-7111 |
| Popis: | The presence of hydrogen in electroformed copper from two different acidic copper sulfate solutions was evaluated: an additive-free solution and a solution including a sugar. D-xylose addition is found to inhibit H incorporation and allows the use of higher cathodic pulses before the copper diffusion limited range starts. TDS experiments show that hydrogen is trapped in the copper samples in two different forms. Hydrogen diffused from copper vacancies was found on all samples at an outgassing temperature of around 450°C. For samples with long pulse times, an additional H2 outgassing peak was found at around 600°C. XRD measurements allowed us to determine the preferential orientation of the plated samples and to monitor lattice parameter evolution with increasing temperature |
| Databáze: | OpenAIRE |
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