| Popis: |
To gain insight into surface processes in plasma processing, basic ion beam experiments are performed on two representative polyatomic-ion species: hydrocarbon ions CH_x^+ for deposition processes and fluorocarbon ions CF_x^+ for etching processes (x=1,2, . . . ). A single ion species is extracted from an inductive plasma via a mass filter and directed onto aluminum surfaces at energies 100 eV) incidence of both CH_x^+ and CF_x^+ species gives rise to dissociation into smaller fragment ions, probably via electronic excitation. |
