| Popis: |
Development of a 4 kV/10 kHz Compact High Voltage Pulser and its application to nitrogen plasma immersion ion implantation (PIII) of different materials as Si, Al alloys, SS304 stainless steel and Ti alloys are discussed. Low voltage (1–5 kV) pulses at high frequencies (up to 20 kHz for 2 kV) were obtained with maximum power delivered at 5 kV, 7 kHz. These conditions were not sufficient to reach temperatures above 200°C in the samples because of short duration of the pulses. However, very shallow implantations of nitrogen in Si, Al5052, SS304 were observed by Auger electron spectroscopy and improved corrosion resistance was obtained for Al5052 when it was treated by nitrogen PIII at 2.5 kV, 5μs and 5 kHz pulses. |
