Submicron focusing of XUV radiation from a laser plasma source using a multilayer Laue lens
| Autor: | Klaus Mann, Peter Großmann, Michael Reese, Armin Bayer, Hans-Ulrich Krebs, Tobias Liese, Bernd Schäfer |
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| Rok vydání: | 2010 |
| Předmět: |
010302 applied physics
Materials science Chemistry(all) business.industry 02 engineering and technology General Chemistry 021001 nanoscience & nanotechnology Laser 01 natural sciences Beam parameter product Focused ion beam law.invention Lens (optics) Physics Operating Procedures Materials Treatment Surfaces and Interfaces Thin Films Characterization and Evaluation of Materials Nanotechnology Optical and Electronic Materials Condensed Matter Physics Optics Materials Science(all) law Extreme ultraviolet 0103 physical sciences Focal length General Materials Science Laser beam quality 0210 nano-technology business Beam (structure) |
| Zdroj: | Applied Physics A. 102:85-90 |
| ISSN: | 1432-0630 0947-8396 |
| DOI: | 10.1007/s00339-010-6148-4 |
| Popis: | The focusing properties of a one-dimensional multilayer Laue lens (MLL) were investigated using monochromatic soft X-ray radiation from a table-top, laser-produced plasma source. The MLL was fabricated by a focused ion beam (FIB) structuring of pulsed laser deposited ZrO2/Ti multilayers. This novel method offers the potential to overcome limitations encountered in electron lithographic processes. Utilizing this multilayer Laue lens, a line focus of XUV radiation from a laser-induced plasma in a nitrogen gas puff target could be generated. The evaluated focal length is close to the designed value of 220 μm for the measurement wavelength of 2.88 nm. Divergence angle and beam waist diameter are measured by a moving knife edge and a far-field experiment, determining all relevant second-order moments based beam parameters. The waist diameter has been found to be approximately 370 nm (FWHM). peerReviewed |
| Databáze: | OpenAIRE |
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