Cyclic Voltammetry Peaks Due to Deep Level Traps in Si Nanowire Array Electrodes

Autor: Tim Albrecht, Foivia Konstantinou, Abdurrahman Shougee, Kristel Fobelets
Rok vydání: 2018
Předmět:
Technology
DEVICES
Silicon
Materials Science
Nanowire
Analytical chemistry
chemistry.chemical_element
Materials Science
Multidisciplinary

SEMICONDUCTOR
02 engineering and technology
deep level traps
01 natural sciences
Capacitance
Physics
Applied

symbols.namesake
Engineering
Silicon nanowires
0103 physical sciences
supercapacitor
Nanoscience & Nanotechnology
Electrical and Electronic Engineering
010302 applied physics
Science & Technology
1007 Nanotechnology
Physics
Doping
Fermi level
Engineering
Electrical & Electronic

0303 Macromolecular and Materials Chemistry
021001 nanoscience & nanotechnology
Isotropic etching
Computer Science Applications
0906 Electrical and Electronic Engineering
electrochemistry
chemistry
Physical Sciences
Electrode
symbols
Science & Technology - Other Topics
1/F NOISE
Cyclic voltammetry
0210 nano-technology
MICROSTRUCTURES
Zdroj: IEEE Transactions on Nanotechnology. 17:154-160
ISSN: 1941-0085
1536-125X
Popis: When metal-assisted chemical etching (MACE) is used to increase the effective surface area of Si electrodes for electrochemical capacitors, it is often found that the cyclic voltammetry characteristics contain anodic and cathodic peaks. We link these peaks to the charging-discharging dynamics of deep level traps within the nanowire system. The trap levels are associated with the use of Ag in the MACE process that can leave minute amounts of Ag residue within the nanowire system to interact with the H2O layer surrounding the nanowires in a room temperature ionic liquid. The influence of the traps can be removed by shifting the Fermi level away from the trap levels via spin-on doping. These results in lower capacitance values but improved charge-discharge cycling behavior. Low-frequency noise measurements proof the presence or absence of these deep level traps.
Databáze: OpenAIRE