Chemical Treatment of CdTe and Solid Solution ZnxCd1-xTe and Cd0,2Hg0,8Te and Aqueous Solutions of HNO3–НІ-Lactate Acid

Autor:	Z.F. Tomashik, V.M. Tomashyk, E.E. Hvozdiyevskyy, R.O. Denysyuk
Rok vydání:	2016
Předmět:	Aqueous solution Materials science Kinetics Polishing Condensed Matter Physics Isotropic etching lcsh:QC1-999 Chemical engineering Etching (microfabrication) General Materials Science Physical and Theoretical Chemistry Single crystal Dissolution lcsh:Physics Solid solution
Zdroj:	Фізика і хімія твердого тіла, Vol 17, Iss 2, Pp 247-250 (2017)
ISSN:	2309-8589 1729-4428
DOI:	10.15330/pcss.17.2.247-250
Popis:	The method of disk rotating kinetics of dissolution processes CdTe, ZnxCd1-xTe and Cd0.2Hg0.8Te in yodvydilyayuchyh etching compositions HNO3-NO-lactate acid. The dependence of etching rate of said material concentration oxidizer and organic solvent. Optimized polishing compositions herbalists and modes chemical dynamic polishing of semiconductor materials studied. The influence of Zn and Hg content in the composition of solid solutions on the quality of the resulting surface etching mixtures.Keywords: semiconductor solid solutions, single crystal, herbalist, surface, chemical etching, polishing.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e49ccfade8dbb0586b7a0a69b03ab288 https://doi.org/10.15330/pcss.17.2.247-250 Zobrazit plný text záznamu