Low-Energy Pulsed Ion Beam Technology with Ultra-High Material Removal Resolution and Widely Adjustable Removal Efficiency
| Autor: | Gang Zhou, Zhouling Wu, Lingbo Xie, Feng Shi, Guangqi Zhou, Ye Tian, Guipeng Tie, Ci Song, Jianda Shao |
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| Rok vydání: | 2021 |
| Předmět: |
Materials science
Ion beam Silicon business.industry Mechanical Engineering Resolution (electron density) chemistry.chemical_element pulse duty cycle Article Pulse (physics) pulse frequency Monocrystalline silicon ultra-high removal resolution Machining chemistry Control and Systems Engineering Duty cycle TJ1-1570 Optoelectronics low-energy pulsed ion beam Mechanical engineering and machinery Electrical and Electronic Engineering business Order of magnitude |
| Zdroj: | Micromachines Volume 12 Issue 11 Micromachines, Vol 12, Iss 1370, p 1370 (2021) |
| ISSN: | 2072-666X |
| Popis: | High-precision optical component manufacturing by ion beam machining tools with ultra-high material removal resolution and dynamically adjustable removal efficiency is important in various industries. In this paper, we propose a low-energy pulsed ion beam (LPIB) technology that can obtain a single pulse with high-resolution material removal by adjusting the pulse frequency and duty cycle, and enable the dynamic adjustment of the removal efficiency. The pulse frequency is 1–100 Hz, and the duty cycle is 0–100%. For monocrystalline silicon, the pulse frequency and duty cycle are set to 100 Hz and 1%, respectively thus, the single-shot pulse depth removal resolution of material is 6.7 × 10−4 nm, which means every 21 pulses can remove one silicon atom layer. Compared with IBF, where the removal resolution of the maximum depth is about 0.01 nm, the controllable resolution is one to two orders of magnitude higher. There is a linear relationship between the removal efficiency of the pulsed ion beam removal function and the pulse duty ratio. The material removal of a single pulse can be adjusted in real time by adjusting the pulse duty cycle and frequency. Owing to its high resolution and wide adjustable removal efficiency, LPIB has broad application prospects in the field of sub-nano-precision surface modification, quality tuning of inertial resonant devices, and so on. This technology is expected to advance surface processing and ultra-precision manufacturing. |
| Databáze: | OpenAIRE |
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