Capillary-force-induced collapse lithography for controlled plasmonic nanogap structures
| Autor: | Younghwan Yang, Inki Kim, Wooseup Hwang, Junsuk Rho, Jungho Mun |
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| Rok vydání: | 2020 |
| Předmět: |
Nanostructure
Materials science Fabrication lcsh:T Capillary action Materials Science (miscellaneous) Nanotechnology 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics lcsh:Technology 01 natural sciences Industrial and Manufacturing Engineering Atomic and Molecular Physics and Optics 0104 chemical sciences lcsh:TA1-2040 Nanosensor Stiction Electrical and Electronic Engineering lcsh:Engineering (General). Civil engineering (General) 0210 nano-technology Lithography Plasmon Nanopillar |
| Zdroj: | Microsystems & Nanoengineering, Vol 6, Iss 1, Pp 1-9 (2020) |
| ISSN: | 2055-7434 |
| Popis: | The capillary force effect is one of the most important fabrication parameters that must be considered at the micro/nanoscale because it is strong enough to deform micro/nanostructures. However, the deformation of micro/nanostructures due to such capillary forces (e.g., stiction and collapse) has been regarded as an undesirable and uncontrollable obstacle to be avoided during fabrication. Here, we present a capillary-force-induced collapse lithography (CCL) technique, which exploits the capillary force to precisely control the collapse of micro/nanostructures. CCL uses electron-beam lithography, so nanopillars with various shapes can be fabricated by precisely controlling the capillary-force-dominant cohesion process and the nanopillar-geometry-dominant collapse process by adjusting the fabrication parameters such as the development time, electron dose, and shape of the nanopillars. CCL aims to achieve sub-10-nm plasmonic nanogap structures that promote extremely strong focusing of light. CCL is a simple and straightforward method to realize such nanogap structures that are needed for further research such as on plasmonic nanosensors. An innovative technique—capillary-force-induced collapse lithography (CCL)—has been developed to easily fabricate plasmonic nano-gap structures, which with a nano-gap of |
| Databáze: | OpenAIRE |
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