Study of black silicon obtained by cryogenic plasma etching: approach to achieve the hot spot of a thermoelectric energy harvester
| Autor: | Leprince, Yamin, Nguyen, N., Abi-Saab, D., Basset, Philippe, Richalot, Elodie, Malak, M., Pavy, N., Flourens, F., Marty, F., Angelescu, D., Leprince-Wang, Y., Bourouina, Tarik |
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| Přispěvatelé: | Mostarshedi, Shermila, Electronique, Systèmes de communication et Microsystèmes (ESYCOM), Conservatoire National des Arts et Métiers [CNAM] (CNAM)-Université Paris-Est Marne-la-Vallée (UPEM)-ESIEE Paris, Institut d’Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520 (IEMN), Institut supérieur de l'électronique et du nunérique (ISEN)-Université Polytechnique Hauts-de-France (UPHF)-Ecole Centrale de Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS), Institut d'électronique fondamentale (IEF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Laboratoire de Physique des Matériaux Divisés et des Interfaces (LPMDI), Université Paris-Est Marne-la-Vallée (UPEM)-Centre National de la Recherche Scientifique (CNRS), Conservatoire National des Arts et Métiers [CNAM] (CNAM), HESAM Université - Communauté d'universités et d'établissements Hautes écoles Sorbonne Arts et métiers université (HESAM)-HESAM Université - Communauté d'universités et d'établissements Hautes écoles Sorbonne Arts et métiers université (HESAM)-Université Paris-Est Marne-la-Vallée (UPEM)-ESIEE Paris, Université Paris-Est Marne-la-Vallée (UPEM) |
| Rok vydání: | 2012 |
| Předmět: |
Plasma etching
Materials science Silicon Spectrometer Physics::Instrumentation and Detectors business.industry Hybrid silicon laser Black silicon chemistry.chemical_element Condensed Matter Physics [SPI.TRON] Engineering Sciences [physics]/Electronics [SPI.TRON]Engineering Sciences [physics]/Electronics Electronic Optical and Magnetic Materials chemistry.chemical_compound Integrating sphere Optics chemistry Hardware and Architecture Etching (microfabrication) [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] Electrical and Electronic Engineering Reactive-ion etching business ComputingMilieux_MISCELLANEOUS |
| Zdroj: | Microsystem Technologies Microsystem Technologies, Springer Verlag, 2012, 18 (11), pp.1807-1814. ⟨10.1007/s00542-012-1486-0⟩ Microsystem Technologies, Springer Verlag, 2013, 18 (11), pp.1807-1814 |
| ISSN: | 1432-1858 0946-7076 |
| DOI: | 10.1007/s00542-012-1486-0 |
| Popis: | International audience; n this paper, we study the enhanced absorption properties of micro/nano structured silicon surface under incident electromagnetic illumination and its capacity to convert light into heat. We simulate the optical reflectance of three-dimensional micro/nano silicon cones of different dimensions and under different electric field incident angles. According to the favorable simulation results, we fabri- cate black silicon with conical microstructures that exhibits excellent anti-reflectivity behavior. Plasma etching under cryogenic temperatures is used for this purpose in an induc- tively coupled plasma-reactive ion etching reactor. The reflectance of the black silicon is measured to be approxi- mately 1 % in the optical wavelength range, by using an integrating sphere coupled to a calibrated spectrometer. Fur- thermore, a device integrating a resistance temperature detector in a black silicon area is developed in order to investigate its efficiency as a photo-thermal converter |
| Databáze: | OpenAIRE |
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