Micropatterned dry electrodes for brain–computer interface
| Autor: | E. Snidero, Luca Gavioli, Roberta Carabalona, Marco Matteucci, Massimo Sancrotti, Furio Gramatica, M. Di Rienzo, M. Casella, E. Di Fabrizio |
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| Rok vydání: | 2007 |
| Předmět: |
Dry electrodes
Materials science brain-computer interface Electronic packaging Nanotechnology micropattern LITHOGRAPHY Condensed Matter Physics Settore FIS/03 - FISICA DELLA MATERIA Atomic and Molecular Physics and Optics Soft lithography Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention law SEM X-ray lithography nanolithography Electrical and Electronic Engineering Photolithography Electroplating LIGA Lithography Biomedical engineering Microfabrication |
| Zdroj: | Microelectronic engineering 84 (2007): 1737–1740. info:cnr-pdr/source/autori:Matteucci, M; Carabalona, R; Casella, M; Di Fabrizio, E; Gramatica, F; Di Rienzo, M; Snidero, E; Gavioli, L; Sancrotti, M/titolo:Micropatterned dry electrodes for brain-computer interface/doi:/rivista:Microelectronic engineering/anno:2007/pagina_da:1737/pagina_a:1740/intervallo_pagine:1737–1740/volume:84 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/j.mee.2007.01.243 |
| Popis: | Electroencephalography (EEG) recordings can be used to help paralyzed patients by replacing functionality of damaged neural connections through the aid of a brain-computer interface. Conventional electrodes used for EEG require long skin preparation due to the impedance of the outermost layers of skin. On the contrary, dry spiked electrodes allow overcoming of impedance problems and can be suitable for long-term measurements. This paper describes microfabrication and packaging of micropatterned dry electrodes built with deep X-ray lithography, electroplating and soft lithography. Preliminary measurements performed with electrodes having different geometries are also described. (c) 2007 Elsevier B.V. All rights reserved. |
| Databáze: | OpenAIRE |
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