Implantation and annealing effects in molecular organic films
| Autor: | Josep M. Ribó, Georgy L. Pakhomov, Luca Ottaviano, V.I. Shashkin, J.M. Tura, L. G. Pakhomov |
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| Rok vydání: | 2002 |
| Předmět: |
Nuclear and High Energy Physics
Materials science Annealing (metallurgy) Phthalocyanines Thin films Inorganic chemistry ESCA Analytical chemistry Heat treatment Electron spectroscopy Implantation Chemical species Ion implantation AFM Instrumentation Irradiation Thin film Chemical composition Chemical decomposition |
| Zdroj: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 194:269-280 |
| ISSN: | 0168-583X |
| Popis: | Ion implantation and annealing effects on the surface of phthalocyanine thin films have been studied by means of atomic force microscopy and electron spectroscopy for chemical analysis. Both the topology and the chemical composition of the surface are affected by irradiation. The influence of the irradiation dose is shown. The chemical degradation of the layer results mainly in the decrease of atomic concentration of nitrogen and chlorine, and in the increase of atomic concentration of oxygen. At highest dose, carbonization becomes important. Furthermore, N 1s, C 1s and Cl 2p core levels testify that the formation of new chemical species occurs in implanted pthalocyanine films. All these processes are modified by subsequent heat treatment in different ways, depending on the applied implantation fluence. |
| Databáze: | OpenAIRE |
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