Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision

Autor:	Thanh Hung Dinh, Masaharu Nishikino, Noboru Hasegawa, Masakazu Washio, Toshiyuki Kitamura, Beata Ziaja, Yuya Kubota, Yuichi Inubushi, Akira Kon, Tadashi Hatano, Takeshi Higashiguchi, Nikita Medvedev, Shigeki Owada, Tomohito Otobe, Tatsunori Shibuya, Kazuyuki Sakaue, Masahiko Ishino
Jazyk:	angličtina
Rok vydání:	2019
Předmět:	Materials science Silicon General Physics and Astronomy chemistry.chemical_element lcsh:Astrophysics 02 engineering and technology Substrate (electronics) Electron 01 natural sciences law.invention SACLA law lcsh:QB460-466 0103 physical sciences ddc:530 010306 general physics business.industry Free-electron laser 021001 nanoscience & nanotechnology Laser lcsh:QC1-999 chemistry Extreme ultraviolet Femtosecond Optoelectronics 0210 nano-technology business lcsh:Physics
Zdroj:	Communications Physics 2(1), 150 (2019). doi:10.1038/s42005-019-0253-2 Communications Physics, Vol 2, Iss 1, Pp 1-9 (2019)
DOI:	10.1038/s42005-019-0253-2
Popis:	Communications Physics 2(1), 150 (2019). doi:10.1038/s42005-019-0253-2 Published by Springer Nature, London
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dfebaf65018be9fce6ad664092005d17 https://bib-pubdb1.desy.de/record/428830 Zobrazit plný text záznamu