Layer-by-layer deposition of Ti–4,4′-oxydianiline hybrid thin films
| Autor: | Maarit Karppinen, Pia Sundberg, Anjali Sood, Jari Malm |
|---|---|
| Rok vydání: | 2011 |
| Předmět: |
Layer by layer
Analytical chemistry General Physics and Astronomy Surfaces and Interfaces General Chemistry Atmospheric temperature range Condensed Matter Physics Surfaces Coatings and Films 4 4'-Oxydianiline chemistry.chemical_compound Atomic layer deposition chemistry Atomic layer epitaxy Thin film Hybrid material ta116 Layer (electronics) |
| Zdroj: | Applied Surface Science. 257:6435-6439 |
| ISSN: | 0169-4332 |
| Popis: | Features of the two thin-film techniques, atomic layer deposition (ALD) and molecular layer deposition (MLD), are combined to build up a stable novel inorganic–organic hybrid material of the (–Ti–N–C6H4–O–C6H4–N–)n type, deposited from successive pulses of TiCl4 and 4,4′-oxydianiline precursors. Depositions in the temperature range of 160–230 °C resulted in unstable films, while the films obtained in the temperature range of 250–490 °C were found stable in atmospheric air. The growth rate increased with increasing temperature, from 0.3 A per cycle at 160 °C to 1.1 A per cycle at 490 °C. |
| Databáze: | OpenAIRE |
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