X-ray Nanoscale Profiling of Layer-by-Layer Assembled Metal/Organophosphonate Films
| Autor: | SonBinh T. Nguyen, Chian Liu, Ray Conley, Joseph A. Libera, Joseph T. Hupp, Michael J. Bedzyk, Richard W. Gurney |
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| Rok vydání: | 2004 |
| Předmět: |
Silicon
Materials science Surface Properties Analytical chemistry Sensitivity and Specificity Organophosphorus Compounds X-Ray Diffraction Total external reflection Monolayer Organometallic Compounds Transition Elements Electrochemistry Nanotechnology General Materials Science Specular reflection Thin film Spectroscopy Molybdenum Aqueous solution Molecular Structure Layer by layer Spectrometry X-Ray Emission Bragg's law Membranes Artificial Surfaces and Interfaces Condensed Matter Physics Nanostructures X-ray reflectivity Crystallography |
| Zdroj: | Langmuir. 20:8022-8029 |
| ISSN: | 1520-5827 0743-7463 |
| DOI: | 10.1021/la048904b |
| Popis: | The nanoscale structure of multilayer metal/phosphonate thin films prepared via a layer-by-layer assembly process was studied using specular X-ray reflectivity (XRR), X-ray fluorescence (XRF), and long-period X-ray standing wave (XSW) analysis. After the SiO(2) X-ray mirror surfaces were functionalized with a monolayer film terminated with phosphonate groups, the organic multilayer films were assembled by alternating immersions in (a) aqueous solutions containing Zr(4+), Hf(4+), or Y(3+) cations and then (b) organic solvent solutions of PO(3)-R-PO(3), where R was a porphyrin or porphyrin-square spacer molecule. The different heavy metal cations provided X-ray fluorescence marker layers at different heights within the different multilayer assemblies. The XSW measurements used a 22 nm period Si/Mo multilayer mirror. The long-period XSW generated by the zeroth-order (total external reflection) through fourth-order Bragg diffraction conditions made it possible to examine the Fourier transforms of the fluorescent atom distributions over a much larger q(z)() range in reciprocal space than previously achieved. |
| Databáze: | OpenAIRE |
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