Lithographic Patterning of Photoreactive Cell-Adhesive Proteins
| Autor: | Christian Franck, David A. Tirrell, Isaac S. Carrico, Paul J. Nowatzki, Sarah C. Heilshorn, Marissa L. Mock, Guruswami Ravichandran, Julie C. Liu, Stacey A. Maskarinec |
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| Rok vydání: | 2007 |
| Předmět: |
Photochemistry
Molecular Sequence Data Cell Nanotechnology Photoresist medicine.disease_cause Biochemistry Article Catalysis Colloid and Surface Chemistry medicine Animals Amino Acid Sequence Lithography Escherichia coli Peptide sequence chemistry.chemical_classification Extracellular Matrix Proteins Microscopy Confocal General Chemistry Fibroblasts Adhesive proteins Rats Amino acid medicine.anatomical_structure chemistry Ultraviolet irradiation Cell Adhesion Molecules |
| Zdroj: | Journal of the American Chemical Society. 129:4874-4875 |
| ISSN: | 1520-5126 0002-7863 |
| DOI: | 10.1021/ja070200b |
| Popis: | We describe a novel, simple method for the photolithographic patterning of cell-adhesive proteins. Intrinsically photoreactive proteins are synthesized in Escherichia coli through incorporation of the non-canonical, photosensitive amino acid para-azidophenylalanine. Upon ultraviolet irradiation at 365 nm, proteins form cross-linked films with elastic moduli that can be tuned by varying the concentration of photoreactive amino acid in the expression medium. Films of these proteins can be directly patterned using standard photolithographic techniques. We demonstrate the utility of this method of protein patterning by creating stable arrays of fibroblast cells on an engineered protein “photoresist”. |
| Databáze: | OpenAIRE |
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