C/Si multilayer mirrors for the 25–30-nm wavelength region
| Autor: | Emile J. Knystautas, Marius Grigonis |
|---|---|
| Rok vydání: | 1997 |
| Předmět: |
Materials science
business.industry Materials Science (miscellaneous) Fresnel equations Industrial and Manufacturing Engineering law.invention Wavelength Optics law Transmission electron microscopy Optoelectronics Business and International Management Thin film business Interfacial roughness Layer (electronics) Deposition (law) Monochromator |
| Zdroj: | Applied Optics. 36:2839 |
| ISSN: | 1539-4522 0003-6935 |
| DOI: | 10.1364/ao.36.002839 |
| Popis: | We report a new material combination, C/Si, for normal-incidence multilayer mirrors in the wavelength region 25-30 nm. The multilayers, fabricated by ion-beam-sputtering deposition, were characterized by near-normal-incidence reflectance measurements by using a discharge source and a grazing-incidence monochromator. The highest measured near-normal-incidence reflectance was R = 23% (25.6 nm), R = 20% (28.3 nm), R = 25% (30.4 nm) at incident angles of 10 degrees , 12 degrees , and 4 degrees , respectively. The multilayers were also characterized by transmission electron microscopy, which revealed sharp layer interfaces and low interfacial roughness. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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