Sputtering of Mo and Al in D2/N2 plasma cleaning discharge
| Autor: | I. A. Arkhipushkin, E. E. Mukhin, A.E. Gorodetsky, A. M. Dmitriev, A. G. Razdobarin, A.P. Zakharov, A.V. Markin, R. Kh. Zalavutdinov, Leonid P. Kazansky, V. L. Bukhovets |
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| Rok vydání: | 2017 |
| Předmět: |
Nuclear and High Energy Physics
Glow discharge Plasma cleaning Chemistry Materials Science (miscellaneous) Floating potential Analytical chemistry Biasing 02 engineering and technology 021001 nanoscience & nanotechnology Mass spectrometry lcsh:TK9001-9401 01 natural sciences 010305 fluids & plasmas Ion Nuclear Energy and Engineering Sputtering 0103 physical sciences lcsh:Nuclear engineering. Atomic power Total pressure 0210 nano-technology |
| Zdroj: | Nuclear Materials and Energy, Vol 12, Iss, Pp 458-461 (2017) |
| ISSN: | 2352-1791 |
| DOI: | 10.1016/j.nme.2017.05.002 |
| Popis: | Sputtering of Mo and Al (as Be proxy) in mixed D2/N2 DC glow discharge was studied in view of the first mirror performance. The composition of the working gas was varied from 100% D2 to 100% N2, while keeping a total pressure of 15 Pa. The ion energies striking the sample surface were defined by its 100 V biasing negative to a floating potential. It has been obtained that the sputtering yield of Mo and Al increases gradually with N2 concentration up to 4‒16 mol% and decreases with further N2 addition. In contrast, the sputtering yield of Be remains unchanged up to 10 mol% of N2. Adding 16 mol% leads to three-fold decrease in the sputtering rate. The sputtering behavior is discussed in context of surface data analysis and mass spectroscopy of the discharge gas exhaust. Variation in reflectivity of a single crystalline Mo due to plasma exposure under similar conditions is also presented and discussed. |
| Databáze: | OpenAIRE |
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