Formation Factors of Watermark for Immersion Lithography

Autor:	Takayoshi Niiyama, Akira Kawai
Rok vydání:	2006
Předmět:	Materials science Physics and Astronomy (miscellaneous) business.industry Bubble General Engineering General Physics and Astronomy Watermark Surface energy Optics Resist Zeta potential Wafer Composite material business Nanoscopic scale Immersion lithography
Zdroj:	Japanese Journal of Applied Physics. 45:5383-5387
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.45.5383
Popis:	In the advanced lithography process, the immersion lithography technique has become important in order to achieve the high quality resist patterns less than 50nm. In this technique, some defects such as a watermark and a nanoscale bubble have been focused as the serious problems to be solved. In actual system of the immersion lithography, the micro droplets of the immersion liquid remains randomly on the resist surface after the wafer scan. In this study, in order to prevent the watermark formation, the in-situ observation of the drying behavior of the water drop is conducted. As the solid defects, polystyrene latex (PSL) particles were mixed with deionized (DI) water. As the formation factors of the watermark, we focused on liquid evaporation, Laplace force, viscosity of liquid, convection in liquid drop (Drelich et al., 2000), surface energy (Harazaki, 1977), and zeta potential and so on.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d9ccfd2e75407c0a3b2c1d259ae9730d https://doi.org/10.1143/jjap.45.5383 Zobrazit plný text záznamu