SiOx and SiOxCzHw mono- and multi-layer deposits for improved polymer oxygen and water vapor barrier properties

Autor: Fabrice Gouanvé, L. Dubost, B. Monaco, Eliane Espuche, R. Charifou
Přispěvatelé: Ingénierie des Matériaux Polymères (IMP), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Université Jean Monnet [Saint-Étienne] (UJM)-Institut National des Sciences Appliquées de Lyon (INSA Lyon), Institut National des Sciences Appliquées (INSA)-Université de Lyon-Institut National des Sciences Appliquées (INSA)-Université de Lyon-Université Claude Bernard Lyon 1 (UCBL), Université de Lyon
Jazyk: angličtina
Rok vydání: 2016
Předmět:
Zdroj: Journal of Membrane Science
Journal of Membrane Science, Elsevier, 2016, 500, pp.245-254. ⟨10.1016/j.memsci.2015.11.040⟩
ISSN: 0376-7388
Popis: International audience; Oxygen and water vapor barrier coatings were made by plasma enhanced chemical vapor deposition on a polymer multilayer substrate. Plasma deposition was realized on the external PET layer of the substrate by using a RF plasma source and two different precursors (trimethylsilane (TMS) and hexamethyldisiloxane (HMDSO)). Two types of monolayer deposits (SiOx and SiOxCzHw) were investigated for each precursor. The structure and composition of the deposited coatings were characterized by FTIR spectroscopy and XPS analysis. Their surface topography was imaged by AFM and the surface energy was determined thanks to contact angle measurements. Oxygen and water barrier properties of the coated substrate were interpreted in terms of coating structure and composition and TMS was identified as the most interesting precursor for enhanced barrier properties. The sensitivity of the coatings to thermal exposure was also investigated. A multilayer deposit approach consisting in alternating organic and inorganic deposited layers was developed. By this route, additional significant enhancement of oxygen and water barrier performances was achieved upon 3 layer deposition.
Databáze: OpenAIRE