Parallelized laser-direct patterning of nanocrystalline metal thin films by use of a pulsed laser-induced thermo-elastic force
| Autor: | Myeongkyu Lee, Hyeonggeun Yoo, Hyunkwon Shin, Sangtae Kim, Boyeon Sim |
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| Rok vydání: | 2009 |
| Předmět: |
Materials science
Macromolecular Substances Surface Properties Molecular Conformation Bioengineering Substrate (electronics) Photoresist law.invention Optics law Etching (microfabrication) Elastic Modulus Materials Testing Nanotechnology General Materials Science Electrical and Electronic Engineering Thin film Particle Size business.industry Mechanical Engineering Lasers Temperature Membranes Artificial General Chemistry Laser Nanocrystalline material Nanostructures Mechanics of Materials Metals Optoelectronics Grain boundary Stress Mechanical business Crystallization Layer (electronics) |
| Zdroj: | Nanotechnology. 20(24) |
| ISSN: | 1361-6528 |
| Popis: | Thin film patterning by the conventional lithographic technique requires a number of steps including the deposition, development, and removal of the photoresist layer. Here we demonstrate that metal thin films evaporated on glass can be directly patterned by a spatially modulated pulsed Nd-YAG laser beam (wavelength = 1064 nm, pulse width = 6 ns) incident from the backside of the substrate. This method utilizes a pulsed laser-induced thermo-elastic force exerted on the film which plays a role in detaching it from the substrate. High-fidelity patterns at the micrometer scale have been fabricated over a few square centimeters by a single pulse with pulse energy of 850 mJ. This is attributed to the fact that deposited metal films are polycrystalline with nano-sized grains, and thus localized etching of the material is possible with shearing along the weakly bonded grain boundary regions. We have also developed a nano-block model to simulate the laser-direct patterning of nanocrystalline thin films. Experimental results could be well described with this simulation model. The patterning process presented here provides a simple photoresist-free route to fabricate metal thin film patterns on transparent substrates. |
| Databáze: | OpenAIRE |
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