| Popis: |
Publisher Summary Silicon monoxide (SiO) is used as a protective layer and antireflecting coating in optical applications and as the dielectric material in certain microelectronic devices. These layers are generally prepared by the rapid evaporation of SiO under high-vacuum conditions. If the deposition is carried out slowly in the presence of a partial pressure of oxygen, the condensate acquires excess oxygen and the O-to-Si-atom ratio rises above unity. These materials are often labeled “SiOx.” For SiO, not much information is available on its optical properties. However, in the visible and near-ultraviolet spectral regions in which data from several sources can be compared, the results agree with one another quite well. This indicates that the SiO is a well defined material, when prepared in the absence of oxygen, with definitive optical properties. The chapter describes various experimental techniques used to obtain optical constants—namely refractive index n and extinction coefficient k for SiO. |
