Multi-pulse atomic layer deposition of p-type SnO thin films: growth processes and the effect on TFT performance

Autor: Gomersall, Daisy E, Niang, Kham M, Parish, James D, Sun, Zhuotong, Johnson, Andrew L, MacManus-Driscoll, Judith L, Flewitt, Andrew J
Přispěvatelé: Gomersall, DE [0000-0003-4275-732X], Niang, KM [0000-0001-5488-6087], Parish, JD [0000-0003-1138-3820], Sun, Z [0000-0002-6951-7265], Johnson, AL [0000-0001-5241-0878], MacManus-Driscoll, JL [0000-0003-4987-6620], Flewitt, AJ [0000-0003-4204-4960], Apollo - University of Cambridge Repository, Gomersall, Daisy E [0000-0003-4275-732X], Niang, Kham M [0000-0001-5488-6087], Parish, James D [0000-0003-1138-3820], Sun, Zhuotong [0000-0002-6951-7265], Johnson, Andrew L [0000-0001-5241-0878], MacManus-Driscoll, Judith L [0000-0003-4987-6620], Flewitt, Andrew J [0000-0003-4204-4960]
Rok vydání: 2023
Předmět:
Popis: Acknowledgements: This work is supported by the EPSRC through the Centre for Doctoral Training in Integrated Photonic and Electronic Systems (IPES) under grant no. EP/L015455/1, and through project grants EP/M013650/1 and EP/P027032/1. For the purpose of open access, the author has applied a Creative Commons Attribution (CC BY) licence to any Author Accepted Manuscript version arising from this submission.
P-type SnO thin films have been deposited using multiple pulses of a novel Sn(ii) precursor per ALD cycle. The study looks at the effect on TFT performance and AFM analysis has explored the change in the growth processes during deposition.
Databáze: OpenAIRE