Impact of Ge alloying on the early growth stages, microstructure and stress evolution of sputter-deposited Cu-Ge thin films
Autor: | Clarisse Furgeaud, Cédric Mastail, A. Michel, Lionel Simonot, Gregory Abadias |
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Přispěvatelé: | Physique et Propriétés des Nanostructures PPNa (PPNa), Département Physique et Mécanique des Matériaux (Département Physique et Mécanique des Matériaux), Institut Pprime (PPRIME), ENSMA-Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers-ENSMA-Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers-Institut Pprime (PPRIME), ENSMA-Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers-ENSMA-Centre National de la Recherche Scientifique (CNRS)-Université de Poitiers, ANR-11-LABX-0017,INTERACTIFS,Interactions and transfers at fluids and solids interfaces(2011) |
Jazyk: | angličtina |
Rok vydání: | 2018 |
Předmět: |
Materials science
Polymers and Plastics Thin films [PHYS.MPHY]Physics [physics]/Mathematical Physics [math-ph] Nucleation 02 engineering and technology 01 natural sciences Cu-Ge alloy [SPI.AUTO]Engineering Sciences [physics]/Automatic chemistry.chemical_compound [PHYS.QPHY]Physics [physics]/Quantum Physics [quant-ph] Sputtering 0103 physical sciences Surface roughness [PHYS.MECA.MEFL]Physics [physics]/Mechanics [physics]/Fluid mechanics [physics.class-ph] Thin film [PHYS.MECA.BIOM]Physics [physics]/Mechanics [physics]/Biomechanics [physics.med-ph] Early stages of growth 010302 applied physics Coalescence (physics) [SPI.ACOU]Engineering Sciences [physics]/Acoustics [physics.class-ph] [PHYS.MECA.VIBR]Physics [physics]/Mechanics [physics]/Vibrations [physics.class-ph] [SPI.FLUID]Engineering Sciences [physics]/Reactive fluid environment [SPI.NRJ]Engineering Sciences [physics]/Electric power Metals and Alloys Intrinsic stress [CHIM.MATE]Chemical Sciences/Material chemistry [PHYS.MECA.MSMECA]Physics [physics]/Mechanics [physics]/Materials and structures in mechanics [physics.class-ph] 021001 nanoscience & nanotechnology Microstructure Grain size Electronic Optical and Magnetic Materials [PHYS.MECA.ACOU]Physics [physics]/Mechanics [physics]/Acoustics [physics.class-ph] Germanide [SPI.ELEC]Engineering Sciences [physics]/Electromagnetism [CHIM.POLY]Chemical Sciences/Polymers chemistry Chemical engineering Ceramics and Composites [PHYS.MECA.THER]Physics [physics]/Mechanics [physics]/Thermics [physics.class-ph] 0210 nano-technology In situ growth monitoring |
Zdroj: | Acta Materialia Acta Materialia, Elsevier, 2018, 159, pp.286-295. ⟨10.1016/j.actamat.2018.08.019⟩ |
ISSN: | 1359-6454 |
DOI: | 10.1016/j.actamat.2018.08.019⟩ |
Popis: | International audience; The effect of Ge alloying on the growth morphology and intrinsic stress evolution during deposition of Cu thin films is investigated using in situ and real time diagnostics, complemented by ex situ microstructural characterizations. Cu1-xGex alloys with x up to 0.15 were sputter-deposited at room temperature on Si substrates, while measuring simultaneously the substrate curvature evolution and surface differential reflectance spectroscopy during the early stages of growth. All films exhibit a typical compressive-tensile-compressive stress behavior, which underpins the distinct stages of a Volmer-Weber growth mode; however, it is revealed that the Ge content plays a decisive role on the nucleation and coalescence stages. This results in a grain size refinement and development of higher compressive stresses for Ge solute additions up to x = 0.07. At higher Ge contents, the strong chemical affinity between Cu and Ge atoms leads to a germanide compound (Cu5Ge) formation and even higher compressive stress. The stress evolutions are discussed considering the surfactant character of Ge atoms affecting Cu adatom mobility and growth morphology. This study highlights the possibility to tailor the early stages of growth and film microstructure (grain size, texture, surface roughness) by introducing solute concentrations of Ge in Cu films. We also determined for the elemental Cu film the percolation and film continuity thicknesses and discussed theses values with respect to those reported for other metallic films. |
Databáze: | OpenAIRE |
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