A single etch-step fabrication-tolerant polarization splitter

Autor: YS Yok-Siang Oei, R Rabah Hanfoug, M.J.E. van de Moosdijk, P.W.L. van Dijk, J.J.G.M. van der Tol, W.J.M. de Laat, LM Luc Augustin, MK Meint Smit
Přispěvatelé: Photonic Integration
Jazyk: angličtina
Rok vydání: 2007
Předmět:
Zdroj: Journal of Lightwave Technology, 25(3), 740-746. IEEE/LEOS
ISSN: 0733-8724
DOI: 10.1109/jlt.2006.890430
Popis: A tolerant single etch-step passive polarization splitter on InP/InGaAsP is designed and fabricated. The device consists of a directional coupler with a wide and a narrow waveguide. Modal birefringence of the third-order modes for transverse electric (TE) and transverse magnetic (TM) polarizations is employed to selectively couple one polarization. Tapering is applied to increase the tolerances. The devices are characterized, and the measurement results show good agreement with the beam-propagation-method simulations: a splitting ratio larger than 95% for a width range of around 100 nm and over a large wavelength range, covering at least the C-band
Databáze: OpenAIRE