Porous Gold Films Fabricated by Wet-Chemistry Processes
| Autor: | Bertrand Grimbert, A. Boe, F. Chassagneux, Remy Bernard, K. Raulin, Odile Cristini, Nathalie Rolland, Aymeric Pastre |
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| Přispěvatelé: | Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Laboratoire de Physique des Lasers, Atomes et Molécules - UMR 8523 (PhLAM), Université de Lille-Centre National de la Recherche Scientifique (CNRS), Laboratoire des Multimatériaux et Interfaces (LMI), Université Claude Bernard Lyon 1 (UCBL), Université de Lyon-Université de Lyon-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institut de Recherche sur les Composants logiciels et matériels pour l'Information et la Communication Avancé - USR 3380 (IRCICA), Centre National de la Recherche Scientifique (CNRS)-Université de Lille |
| Rok vydání: | 2016 |
| Předmět: |
Materials science
Article Subject Silicon chemistry.chemical_element Nanotechnology [CHIM.MATE]Chemical Sciences/Material chemistry 02 engineering and technology Substrate (electronics) 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences chemistry.chemical_compound chemistry Colloidal gold lcsh:Technology (General) lcsh:T1-995 General Materials Science Cubic zirconia Polystyrene 0210 nano-technology Porosity Layer (electronics) Wet chemistry |
| Zdroj: | Journal of Nanomaterials Journal of Nanomaterials, Hindawi Publishing Corporation, 2016, 2016, pp.3536153. ⟨10.1155/2016/3536153⟩ Journal of Nanomaterials, 2016, 2016, pp.3536153. ⟨10.1155/2016/3536153⟩ Journal of Nanomaterials, Vol 2016 (2016) |
| ISSN: | 1687-4129 1687-4110 |
| DOI: | 10.1155/2016/3536153 |
| Popis: | Porous gold films presented in this paper are formed by combining gold electroless deposition and polystyrene beads templating methods. This original approach allows the formation of conductive films (2 × 106 (Ω·cm)−1) with tailored and interconnected porosity. The porous gold film was deposited up to 1.2 μm on the silicon substrate without delamination. An original zirconia gel matrix containing gold nanoparticles deposited on the substrate acts both as an adhesion layer through the creation of covalent bonds and as a seed layer for the metallic gold film growth. Dip-coating parameters and gold electroless deposition kinetics have been optimized in order to create a three-dimensional network of 20 nm wide pores separated by 20 nm thick continuous gold layers. The resulting porous gold films were characterized by GIXRD, SEM, krypton adsorption-desorption, and 4-point probes method. The process is adaptable to different pore sizes and based on wet-chemistry. Consequently, the porous gold films presented in this paper can be used in a wide range of applications such as sensing, catalysis, optics, or electronics. |
| Databáze: | OpenAIRE |
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