| Autor: |
W. W. R. Araujo, Maria Cecília Barbosa da Silveira Salvadori, N. S. Sochugov, R. E. Spirin, Fernanda de Sá Teixeira, L. G. Sgubin, Ian G. Brown |
| Rok vydání: |
2011 |
| Předmět: |
|
| Zdroj: |
The Review of scientific instruments. 81(12) |
| ISSN: |
1089-7623 |
| Popis: |
We describe the design and implementation of a high voltage pulse power supply (pulser) that supports the operation of a repetitively pulsed filtered vacuum arc plasma deposition facility in plasma immersion ion implantation and deposition (Mepiiid) mode. Negative pulses (micropulses) of up to 20 kV in magnitude and 20 A peak current are provided in gated pulse packets (macropulses) over a broad range of possible pulse width and duty cycle. Application of the system consisting of filtered vacuum arc and high voltage pulser is demonstrated by forming diamond-like carbon (DLC) thin films with and without substrate bias provided by the pulser. Significantly enhanced film/substrate adhesion is observed when the pulser is used to induce interface mixing between the DLC film and the underlying Si substrate. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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