Investigations of silicon oxide UV emission in a non-thermal atmospheric plasma—comparison with synthetic spectra
| Autor: | Raymond Viladrosa, Fabien Coursimault, Jean-Michel Pouvesle, Olivier Motret |
|---|---|
| Přispěvatelé: | GREMAN (matériaux, microélectronique, acoustique et nanotechnologies) (GREMAN - UMR 7347), Université de Tours-Institut National des Sciences Appliquées - Centre Val de Loire (INSA CVL), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Centre National de la Recherche Scientifique (CNRS), Institut National des Sciences Appliquées - Centre Val de Loire (INSA CVL), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Université de Tours (UT)-Centre National de la Recherche Scientifique (CNRS) |
| Rok vydání: | 2003 |
| Předmět: |
010302 applied physics
Acoustics and Ultrasonics Chemistry [SPI.PLASMA]Engineering Sciences [physics]/Plasmas Analytical chemistry Rotational temperature [CHIM.MATE]Chemical Sciences/Material chemistry 02 engineering and technology Dielectric barrier discharge Plasma 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Molecular electronic transition Spectral line Surfaces Coatings and Films Electronic Optical and Magnetic Materials 0103 physical sciences Gas composition 0210 nano-technology Silicon oxide ComputingMilieux_MISCELLANEOUS Excitation |
| Zdroj: | Journal of Physics D: Applied Physics Journal of Physics D: Applied Physics, IOP Publishing, 2003, 36 (17), pp.2060-2066. ⟨10.1088/0022-3727/36/17/307⟩ |
| ISSN: | 1361-6463 0022-3727 |
| Popis: | UV emission of silicon oxide molecules observed from a non-thermal atmospheric pulsed dielectric barrier discharge was experimentally explored in a spectral range from 228 to 253 nm. The main vibrational bands (1, 1), (2, 2) and (0, 1) of A 1Π–X 1Σ+ electronic transition were investigated. Corresponding synthetic spectra was built up and adjusted with good agreement. Excitation temperatures (Tvib, Trot) were deduced as a function of gas composition. It is shown that the rotational temperature can represent a non-intrusive diagnostic of plasma gas temperature in process control. |
| Databáze: | OpenAIRE |
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