Regioselective functionalization of dimpled silica particles

Autor: Etienne Duguet, Serge Ravaine, Céline Hubert, Cyril Chomette, Mona Tréguer-Delapierre, Jérôme Majimel, Pierre-Etienne Rouet, Antony Désert, Adeline Perro, Stéphane Mornet
Přispěvatelé: Centre de Recherche Paul Pascal (CRPP), Université de Bordeaux (UB)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institut des Sciences Moléculaires (ISM), Centre National de la Recherche Scientifique (CNRS)-École Nationale Supérieure de Chimie et de Physique de Bordeaux (ENSCPB)-Université Sciences et Technologies - Bordeaux 1-Université Montesquieu - Bordeaux 4-Institut de Chimie du CNRS (INC), Institut de Chimie de la Matière Condensée de Bordeaux (ICMCB), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Institut Polytechnique de Bordeaux-Université de Bordeaux (UB), ANR-07-BLAN-0271,Towards colloïd,Towards Colloidal Molecules and Functional Materials(2007), ANR-10-IDEX-0003,IDEX BORDEAUX,Initiative d'excellence de l'Université de Bordeaux(2010)
Rok vydání: 2016
Předmět:
Zdroj: Colloids and Surfaces A: Physicochemical and Engineering Aspects
Colloids and Surfaces A: Physicochemical and Engineering Aspects, Elsevier, 2016, 510, pp. 239-244. ⟨10.1016/j.colsurfa.2016.05.089⟩
ISSN: 0927-7757
Popis: International audience; Multipod-like particles made of a silica core surrounded by polystyrene nodules have been used as precur-sors to synthesize silica particles with 3 or 12 dimples through the selective growth of the dielectric core.Using the polymer nodules as temporary protecting masks, we regioselectively grafted amino groupsonto the unprotected silica surface, as revealed by the adsorption of gold markers. After dissolution ofthe PS nodules, some polymer chains remained grafted onto the silica surface, forming organic bumps atthe bottom of the dimples. These residues were also selectively functionalized, leading to silica particleswith both entropic and enthalpic patches.
Databáze: OpenAIRE