Precursors for chemical vapor deposition of yttrium barium copper oxide
| Autor: | B. Obi, D.J. Otway, W.S. Rees |
|---|---|
| Rok vydání: | 1997 |
| Předmět: |
Materials science
Hybrid physical-chemical vapor deposition Mechanical Engineering Inorganic chemistry Metals and Alloys Nanotechnology Chemical vapor deposition Yttrium barium copper oxide Combustion chemical vapor deposition chemistry.chemical_compound Atomic layer deposition Carbon film chemistry Mechanics of Materials Physical vapor deposition Materials Chemistry Thin film |
| Zdroj: | Scopus-Elsevier |
| ISSN: | 0925-8388 |
| DOI: | 10.1016/s0925-8388(96)02682-5 |
| Popis: | There exists a need for reproducible large area, high quality, thin films of YBa 2 Cu 3 O 7−δ for insertion into magnetic resonance imaging and cellular base station applications. One approach to the fabrication of these films, chemical vapor deposition, currently has some limitations placed upon it by the available range of precursor compounds. This report discusses the present commercial options, with an emphasis on the effort demanded to qualify a specific compound for utilization in a manufacturing environment. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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