High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells

Autor:	Nichole Sullivan, Todd D. Day, John V. Badding, Justin R. Sparks, Rongrui He
Rok vydání:	2016
Předmět:	Amorphous silicon Materials science Mechanical Engineering technology industry and agriculture Nanocrystalline silicon food and beverages 02 engineering and technology Combustion chemical vapor deposition equipment and supplies 010402 general chemistry 021001 nanoscience & nanotechnology complex mixtures 01 natural sciences 0104 chemical sciences Amorphous solid chemistry.chemical_compound Carbon film Amorphous carbon chemistry Chemical engineering Mechanics of Materials Plasma-enhanced chemical vapor deposition General Materials Science Thin film 0210 nano-technology
Zdroj:	Advanced materials (Deerfield Beach, Fla.). 28(28)
ISSN:	1521-4095
Popis:	Thin films of hydrogenated amorphous silicon can be produced at MPa pressures from silane without the use of plasma at temperatures as low as 345 °C. High pressure chemical vapor deposition may open a new way to low cost deposition of amorphous silicon solar cells and other thin film structures over very large areas in very compact, simple reactors.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ca40a7a56e9e8970145ddd7cbef56e25 https://pubmed.ncbi.nlm.nih.gov/27174318 Zobrazit plný text záznamu Plný text