Direct top–down fabrication of nanoscale electrodes for organic semiconductors using fluoropolymer resists
| Autor: | Jonathan Ho, Eleanor E. B. Campbell, Jungho Park, Myeongjin Park, Seungmoon Pyo, Sangwook Lee, Miri Seo, Hoyeol Yun, Changhee Lee, Junghyun Lee |
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| Rok vydání: | 2012 |
| Předmět: |
Fabrication
Materials science organic semiconductor business.industry Nanotechnology General Chemistry Organic semiconductor Pentacene chemistry.chemical_compound Resist chemistry nanoelectrode fabrication Optoelectronics Fluoropolymer General Materials Science Thin film business Lithography Electron-beam lithography |
| Zdroj: | Park, J, Ho, J, Yun, H, Park, M, Lee, J H, Seo, M, Campbell, E E B, Lee, C, Pyo, S & Lee, S 2013, ' Direct top-down fabrication of nanoscale electrodes for organic semiconductors using fluoropolymer resists ', Applied Physics A: Materials Science and Processing, vol. 111, no. 4, pp. 1051-1056 . https://doi.org/10.1007/s00339-012-7411-7 |
| ISSN: | 1432-0630 0947-8396 |
| Popis: | We report the use of a fluoropolymer resist for the damage-free e-beam lithographic patterning of organic semiconductors. The same material is also shown to be suitable as an orthogonal electron beam resist for the patterning of top-contact electrodes on organic thin films. We demonstrate this by characterizing pentacene field effect transistors with feature sizes as small as 100 nm and compare the performance of bottom- and top-contacted devices. |
| Databáze: | OpenAIRE |
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