| Autor: |
D. F. Wong, Ronggang Yu, Xiaoping Tang, Ruiqi Tian |
| Rok vydání: |
2003 |
| Předmět: |
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| Zdroj: |
ICCAD |
| DOI: |
10.1109/iccad.2002.1167581 |
| Popis: |
Electron projection lithography (EPL) is a leading candidate for next generation lithography (NGL) in VLSI production. The membrane mask used in EPL is divided into sub-fields by struts for structural support. A layout must be partitioned into these sub-fields on mask and then stitched back together by the EPL tool on wafer. To minimize possible stitching errors, partitioning of a mask layout should minimize cuts of layout features in the overlapping area between two adjacent sub-fields. This paper presents the first formulation of the mask layout partitioning problem for EPL as a graph problem. The graph formulation is optimally solved with a shortest path approach. Two other techniques are also presented to speed up computation. Experimental runs on data from a real industry design show excellent results. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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