Ion acceleration in non-equilibrium plasmas driven by fast drifting electron

Autor: G. Castroa (a, F. Di Bartolo (c), N. Gambino (a, D. Mascali (a, e, F.P. Romano (a, A. Anzalone(a), L. Celona(a), S. Gammino(a), R. Di Giugno(a, D. Lanaia(a), R. Miracoli(a, T. Serafino(e), S. Tudisco(a
Rok vydání: 2012
Předmět:
Zdroj: Applied surface science 272, 59-64 (2013). doi:10.1016/j.apsusc.2012.11.105
Applied surface science 72 (2013): 59–64. doi:10.1016/j.apsusc.2012.11.105
info:cnr-pdr/source/autori:G. Castroa (a,b), F. Di Bartolo (c), N. Gambino (a,d), D. Mascali (a,e,), F.P. Romano (a,f), A. Anzalone(a), L. Celona(a), S. Gammino(a), R. Di Giugno(a,b), D. Lanaia(a), R. Miracoli(a,b), T. Serafino(e), S. Tudisco(a,e)/titolo:Ion acceleration in non-equilibrium plasmas driven by fast drifting electron/doi:10.1016%2Fj.apsusc.2012.11.105/rivista:Applied surface science/anno:2013/pagina_da:59/pagina_a:64/intervallo_pagine:59–64/volume:72
DOI: 10.1016/j.apsusc.2012.11.105
Popis: We hereby present results on ion acceleration mechanisms in non equilibrium plasmas generated by microwaves or high intensity laser pulses. Experiments point out that in magnetized plasmas X–B conversion takes place for under resonance values of the magnetic field, i.e. an electromagnetic mode is converted into an electrostatic wave. The strong self-generated electric field, of the order of 10 7 V/m, causes a E × B drift which accelerates both ions and electrons, as it is evident by localized sputtering in the plasma chamber. These fields are similar (in magnitude) to the ones obtainable in laser generated plasmas at intensity of 10 12 W/cm 2 . In this latter case, we observe that the acceleration mechanism is driven by electrons drifting much faster than plasma bulk, thus generating an extremely strong electric field ∼10 7 V/m. The two experiments confirm that ions acceleration at low energy is possible with table-top devices and following complementary techniques: i.e. by using microwave-driven (producing CW beams) plasmas, or non-equilibrium laser-driven plasmas (producing pulsed beams). Possible applications involve ion implantation, materials surface modifications, ion beam assisted lithography, etc.
Databáze: OpenAIRE